Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography.
نویسندگان
چکیده
Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact table-top set up.
منابع مشابه
Table top nanopatterning with extreme ultraviolet laser illumination
Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiment...
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عنوان ژورنال:
- Optics express
دوره 15 6 شماره
صفحات -
تاریخ انتشار 2007